K6.3 - Station for deep X-ray lithography (LIGA)
Station for deep X-ray lithography is intended for exhibiting "white" SR beam through shady mask of polymethylmethacrylate layers (PMMA) on carrier bodies or by the way of free sheets, sensible for X- radiation with absorption path in PMMA in the ranges from tens up to hundreds microns. Resulting microstructures can represent separate optical components or whole complex optical systems with given configurations, liquid modules with a variety of channel forms, etc. In prospect, structures may have linear dimensions up to several microns and relief depth up to 1 mm.
Scanner, belonging to the station, allows to work with resist on plates with diameter up to 100 mm and SR beam aperture 70 × 7 mm.
Station contains:
- Scanner - for alternate/reciprocal shift of mask and substrate with resist athwart to SR beam. The camera for sample and mask is mounted on the platform, constrained with channel by bellows unit and vertically shifted with hydraulic drive. Shifting is controlled by computer by the way of codes, giving repetition rate, number of controlling impulses and shift direction. Beam size 70 × 7 mm.
- System for camera spooling and following filling in with helium gas.
Scheme of the last part of the DXRL channel
Columnar microstructures with the height of 1 mm
Resist SU-8
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The fragment of polymeric form
of acceleration sensor.
X-ray resist PMMA.
Structure height 510 µm.
Cylinder side thickness - 5 µm
(aspect ratio - 100). |
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Address: 1 Academic Kurchatov sq.,
Moscow, 123182, Russian Federation
RRC "Kurchatov Institute", KCSRNT
Phone: +7 (499) 196-75-38, 196-71-10
Fax: +7 (499) 196-77-23
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