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D'4.1 - Station for photoelectron spectroscopy (FS)

Ultrahigh vacuum photoelectron spectrometer is dedicated for complex in situ research of thin films, multi-layer thin-film structures and fresh crystal cleavages. Spectrometer consists of the main camera, the preparatory camera and the camera of ion sputtering. The utmost vacuum value is 10-10 Torr. The main and preparatory cameras have the build in modules for ionic refinement of samples and for their analysis with the use of LEED, EELS, luminescent and Auger spectroscopy, as well as modules for thermal and electron-beam sputtering. The original system for sample transportation allows to load samples and move them inside the spectrometer without loss of vacuum. The temperature of samples is 4-1200 K.

The scheme of the station

1. radiation source
2. diffraction grating
3. flat mirror
4. flat grazing incidence grating
5. toroidal focusing mirror; output slit
6. output toroidal focusing mirror
7. sample

NORMAL INCIDENCE MONOCHROMATOR:
Photon energy range
3–35 eV, resolution ~ 0.1 nm
GRAZING INCIDENCE SETUP:
Photon energy range
20–100 eV


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